Radiant energy – Inspection of solids or liquids by charged particles – Methods
Reexamination Certificate
2011-04-19
2011-04-19
Johnston, Phillip A (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Methods
C250S310000, C250S311000
Reexamination Certificate
active
07928378
ABSTRACT:
A substrate inspection apparatus1-1(FIG.1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage26-1with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system20-1and guiding it to a detecting system35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
REFERENCES:
patent: 3858049 (1974-12-01), Koch et al.
patent: 4508968 (1985-04-01), Kobayashi et al.
patent: 4726689 (1988-02-01), Pollock
patent: 4911103 (1990-03-01), Davis et al.
patent: 4912052 (1990-03-01), Miyoshi et al.
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5389787 (1995-02-01), Todokoro et al.
patent: 5536128 (1996-07-01), Shimoyashiro et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5665968 (1997-09-01), Meisburger et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 5914493 (1999-06-01), Morita et al.
patent: 5976328 (1999-11-01), Azuma et al.
patent: 5981947 (1999-11-01), Nakasuji et al.
patent: 5986263 (1999-11-01), Hiroi et al.
patent: 6023068 (2000-02-01), Takahashi et al.
patent: 6087667 (2000-07-01), Nakasuji et al.
patent: 6125522 (2000-10-01), Nakasuji
patent: 6225627 (2001-05-01), Koyama
patent: 6315512 (2001-11-01), Tabrizi et al.
patent: 6329826 (2001-12-01), Shinada et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6475050 (2002-11-01), Mogi et al.
patent: 6476913 (2002-11-01), Machida et al.
patent: 6518582 (2003-02-01), Kohama
patent: 6857938 (2005-02-01), Smith et al.
patent: 2007/0029504 (2007-02-01), Saito et al.
patent: 0 312 082 (1989-04-01), None
patent: 1 061 359 (2000-12-01), None
patent: 2171119 (1986-08-01), None
patent: 58-18833 (1983-02-01), None
patent: 5-206226 (1993-08-01), None
patent: 9-180665 (1997-07-01), None
patent: 11-223662 (1999-08-01), None
patent: 2000-149853 (2000-05-01), None
patent: 2000-161948 (2000-06-01), None
patent: 2000-315712 (2000-11-01), None
patent: 2000-323538 (2000-11-01), None
Electron/Ion Beam Handbook; 2nd version, pp. 115-119,1988.
B. Lischke. et al.; Japanese Journal of Applies Physics; vol. 28, No. 10, pp. 2058-2064, 1989.
P. Sandland, et al., An Electron-Beam Inspection System for X-ray Mask Production; Journal of Vacuum Science and Technology; vol. 9, No. 6, pp. 3005-3009, 1991.
W. D. Meisburger, et al., Requirements and Performance of an Electron-Beam Column Designed for X ray Mask Inspection; Journal of Vacuum Science and Technology; vol. 9, No. 6, pp. 3010-3014, 1991.
U.S. Appl. No. 09/985,323, filed Nov. 2, 2001; Mamoru Nakasuji et al.; Electron Beam Apparatus and Device Production Method Using the Electron Beam Apparatus.
U.S. Appl. No. 09/985,325, filed Nov. 2, 2001; Mamoru Nakasuji et al.; Electron Beam Apparatus and Method of Manufacturing Semiconductor Device Using the Apparatus.
U.S. Appl. No. 09/985,331, filed Nov. 2, 2001; Mamoru Nakasuji et al.; Method for Inspecting Substrate, Substrate Inspecting System and Electron Beam Apparatus.
U.S. Appl. No. 09/985,322, filed Nov. 2, 2001; Mamoru Nakasuji et al.; Electron Beam Apparatus and Method of Manufacturing Semiconductor Device Using the Apparatus.
Translation of Japanese Office Action issued on Dec. 14, 2006 of Japanese counterpart application.
Hatakeyama Masahiro
Karimata Tsutomu
Kimba Toshifumi
Murakami Takeshi
Nakasuji Mamoru
Ebara Corporation
Johnston Phillip A
Westerman Hattori Daniels & Adrian LLP
LandOfFree
Apparatus for inspection with electron beam, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for inspection with electron beam, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for inspection with electron beam, method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2637642