Apparatus for inspection with electron beam, method for...

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

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C250S310000, C250S311000

Reexamination Certificate

active

07928378

ABSTRACT:
A substrate inspection apparatus1-1(FIG.1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage26-1with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system20-1and guiding it to a detecting system35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

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Translation of Japanese Office Action issued on Dec. 14, 2006 of Japanese counterpart application.

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