Apparatus for infrared pyrometer calibration in a thermal proces

Thermal measuring and testing – Thermal calibration system – By thermal radiation emitting device

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

374131, 374141, 2502521, G01K 1500

Patent

active

060862459

ABSTRACT:
A calibration instrument for calibrating a temperature probe, such as pyrometer, uses a stable light source, such as a light emitting diode, to simulate a blackbody of a known temperature. The light source is located inside a chamber and emits light through an aperture. The calibration instrument may be inserted into a thermal processing chamber, or the temperature probe may be removed from the chamber. An alignment tool aligns the aperture to the input of the temperature probe. The calibration instrument may be integrated with the alignment tool, or it may be removable.

REFERENCES:
patent: 4544418 (1985-10-01), Gibbons
patent: 4876453 (1989-10-01), Wirick
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5265957 (1993-11-01), Moslehi et al.
patent: 5317492 (1994-05-01), Gronet et al.
patent: 5324937 (1994-06-01), Chen et al.
patent: 5326170 (1994-07-01), Moslehi et al.
Pyzhkov et al., "Stable Source of Infrared Radiation for Photometer Calibration," Measurement Techniques, pp. 278-279 vol. 29, No. 4, Apr. 1986.
Bryant et al., "Infrared Absorption Measurements in the Field Using Led Sources," Power Engineering Journal, pp. 56-60, Mar. 1992.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for infrared pyrometer calibration in a thermal proces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for infrared pyrometer calibration in a thermal proces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for infrared pyrometer calibration in a thermal proces will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-535062

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.