Apparatus for improving the performance of a temperature-sensiti

Details Apparatus for improving the performance of a temperature-sensiti Apparatus for improving the performance of a temperature-sensiti

1998-01-09

2000-05-02

Beck, Shrive

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723E, 118724, C23C 1600, H05H 100

Patent

active

06056850&

ABSTRACT:
The temperature of a dry etch process of a semiconductor substrate in a plasma etch chamber is controlled to maintain selectivity while also providing a high etch rate by introducing one or more cooling steps into the etch process. To maintain selectivity of the etch as well as a high rate of etch, the formation of plasma is terminated prior to exceeding a predetermined maximum temperature at at least one selected location in the chamber. The temperature at the selected location is reduced prior to the resumption of plasma flow and etching. The plasma etch is then continued, and may optionally be terminated again to permit cooling, as needed, until etching has been completed.

REFERENCES:
patent: 3887407 (1975-06-01), Ono et al.
patent: 4115184 (1978-09-01), Poulsen
patent: 4424621 (1984-01-01), Abbas et al.
patent: 4500563 (1985-02-01), Ellenberger et al.
patent: 4502914 (1985-03-01), Trumpp et al.
patent: 4971653 (1990-11-01), Powell et al.
patent: 5002794 (1991-03-01), Ratner et al.
patent: 5167748 (1992-12-01), Hall
patent: 5213659 (1993-05-01), Blalock et al.
patent: 5286344 (1994-02-01), Blalock et al.
patent: 5290381 (1994-03-01), Nozawa et al.
patent: 5334251 (1994-08-01), Nashimoto
patent: 5346585 (1994-09-01), Doan et al.
patent: 5362666 (1994-11-01), Dennison
patent: 5407531 (1995-04-01), Chiu et al.
patent: 5436172 (1995-07-01), Moslehi
patent: 5446825 (1995-08-01), Moslehi et al.
patent: 5474648 (1995-12-01), Patrick et al.
patent: 5547539 (1996-08-01), Arasawa et al.
patent: 5548470 (1996-08-01), Husain et al.
patent: 5567267 (1996-10-01), Kazama et al.
patent: 5584971 (1996-12-01), Komino

Affiliated with

Also associated with

Rating

Apparatus for improving the performance of a temperature-sensiti does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for improving the performance of a temperature-sensiti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for improving the performance of a temperature-sensiti will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1591321