Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-04-23
2000-02-22
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
156345, 31511121, 118723MW, C23C 1600
Patent
active
060267623
ABSTRACT:
An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.
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Augason Calvin R.
Kao Chien-Teh
Pham Quyen
Rose Ronald L.
Tsai Kenneth
Alejandro Luz
Applied Materials Inc.
Dang Thi
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