Apparatus for imprinting lithography and fabrication thereof

Details Apparatus for imprinting lithography and fabrication thereof Apparatus for imprinting lithography and fabrication thereof

2006-11-28

2006-11-28

Pham, Thanhha (Department: 2813)

Active solid-state devices (e.g., transistors, solid-state diode

Physical configuration of semiconductor

With specified crystal plane or axis

C257S622000

Reexamination Certificate

active

07141866

ABSTRACT:
An imprinting apparatus and method of fabrication provide a mold having a pattern for imprinting. The apparatus includes a semiconductor substrate polished in a [110] direction. The semiconductor substrate has a (110) horizontal planar surface and vertical sidewalls of a wet chemical etched trench. The sidewalls are aligned with and therefore are (111) vertical lattice planes of the semiconductor substrate. The semiconductor substrate includes a plurality of vertical structures between the sidewalls, wherein the vertical structures may be nano-scale spaced apart. The method includes wet etching a trench with spaced apart (111) vertical sidewalls in an exposed portion of the (110) horizontal surface of the semiconductor substrate along (111) vertical lattice planes. A chemical etching solution is used that etches the (111) vertical lattice planes slower than the (110) horizontal lattice plane. The method further includes forming the imprinting mold.

REFERENCES:
patent: 5772905 (1998-06-01), Chou
patent: 6294450 (2001-09-01), Chen et al.
patent: 6309580 (2001-10-01), Chou
patent: 6365059 (2002-04-01), Pechenik
patent: 6407443 (2002-06-01), Chen et al.
patent: 2003/0219992 (2003-11-01), Schaper
patent: 2004/0156108 (2004-08-01), Chou et al.
“Making nanowire lattices in a snap”, Materialstoday, vol. 6, Issue 5, May 2003, p. 6.
Nicholas A. Melosh, et al., Ultrahigh-Density Nanowire Lattices and Circuits, Sciencexpress, Mar. 13, 2003, pp. 1-4 & 6 figures, www.sciencexpress.org, 10.1126/science.1081940.

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