Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-02-13
2007-02-13
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S601000, C356S630000
Reexamination Certificate
active
11048552
ABSTRACT:
This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.
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Burke Elliot
Cahill James M.
Carlisle Clinton B.
Pham Hung
Ruth Douglas E.
Pham Hoa Q.
Stallman & Pollock LLP
Tokyo Electron Limited
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