Apparatus for holding substrate to be polished

Details Apparatus for holding substrate to be polished Apparatus for holding substrate to be polished

1997-12-16

2000-06-13

Rose, Robert

Abrading

Work holder

Vacuum

451288, B24B 722

Patent

active

060742895

ABSTRACT:
An apparatus for holding a substrate to be polished comprises: a rotating rotary shaft; a substrate holding head in the form of a disc; a sealing member provided to the back face of the substrate holding head; a guiding member which is provided to the back face of the substrate holding head to be located outside the sealing member; and a fluid flow path which vertically penetrates the inside of the substrate holding head. The fluid flow path allows an air under pressure introduced from the upper end side thereof to flow out through the opening at the lower end thereof to a space. The sealing member is formed with a ventilation body having a large number of successive vent openings in the inside such as nonwoven fabric.

REFERENCES:
patent: 5635083 (1997-06-01), Breivogel et al.
patent: 5645474 (1997-07-01), Kubo et al.
patent: 5791973 (1998-08-01), Nishio

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