Apparatus for guiding air current in a wafer loading chamber for

Details Apparatus for guiding air current in a wafer loading chamber for Apparatus for guiding air current in a wafer loading chamber for

1997-03-19

2000-03-14

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

118724, 414935, 414937, C23C 1600

Patent

active

060367814

ABSTRACT:
An air current guiding apparatus includes a plurality of dampers installed on a filter unit on an inner wall of air supply unit for blowing clean air over wafers loaded in a boat for transfer to a reaction chamber for chemical vapor deposition. Each of the dampers has a certain length and angular orientation to force the air in a designated direction so that the air current in a wafer loading chamber maintains an appropriate velocity and is free from air turbulence, thereby minimizing the number of contaminating particles in the wafer loading chamber.

REFERENCES:
patent: 5181819 (1993-01-01), Sakata et al.
patent: 5221201 (1993-06-01), Yamaga et al.
patent: 5261935 (1993-11-01), Ishii et al.
patent: 5277579 (1994-01-01), Takanabe
patent: 5378283 (1995-01-01), Ushikawa
patent: 5388944 (1995-02-01), Takanabe et al.
patent: 5433785 (1995-07-01), Saito
patent: 5447294 (1995-09-01), Sakata et al.
patent: 5536320 (1996-07-01), Ushikawa et al.
patent: 5551984 (1996-09-01), Tanahashi
patent: 5562383 (1996-10-01), Iwai et al.
patent: 5810538 (1998-09-01), Ozawa et al.

Affiliated with

Also associated with

Rating

Apparatus for guiding air current in a wafer loading chamber for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for guiding air current in a wafer loading chamber for, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for guiding air current in a wafer loading chamber for will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-165134