Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Patent
1997-05-09
1999-08-10
Hiteshew, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
117 32, 117218, 117917, C30B 3500
Patent
active
059353279
ABSTRACT:
An apparatus for producing silicon crystals (24) having highly uniform characteristics from a silicon melt (22) comprising a furnace (12), a crucible (14) disposed within the furnace (12) for containing the silicon melt (22), a heater (20) disposed around the crucible (14) for heating the silicon melt (22) and a pair of cusp magnets (28, 30) disposed around the furnace (12) and spaced a distance apart from one another such that the distance between the cusp magnets (28, 30) is variable.
REFERENCES:
patent: 4565671 (1986-01-01), Matutani et al.
patent: 4592895 (1986-06-01), Matsutani et al.
patent: 4830703 (1989-05-01), Matsutani
patent: 5009865 (1991-04-01), Boden et al.
Dangel Michael D.
Grimes H. Michael
Hariri Farouk A.
Donaldson Richard L.
Hiteshew Felisa
Hoel Carlton H.
Texas Instruments Incorporated
Valetti Mark A.
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