Apparatus for growing a thin metallic film

Coating apparatus – Gas or vapor deposition – With treating means

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118715, 118726, C23C 1600

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active

054620147

ABSTRACT:
Gold or copper is grown on a substrate by a chemical vapor deposition method using a .beta.-ketonato type metal complex of gold or copper as a starting material and introducing the starting material to the substrate using as a carrier gas a mixed gas composed of hydrogen and a substance which can bond to the starting material in a state where electron is donated from the substance to the starting material to form a molecular compound.

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