Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-02-23
1995-10-31
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118726, C23C 1600
Patent
active
054620147
ABSTRACT:
Gold or copper is grown on a substrate by a chemical vapor deposition method using a .beta.-ketonato type metal complex of gold or copper as a starting material and introducing the starting material to the substrate using as a carrier gas a mixed gas composed of hydrogen and a substance which can bond to the starting material in a state where electron is donated from the substance to the starting material to form a molecular compound.
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Arita Yoshinobu
Awaya Nobuyoshi
Bueker Richard
Nippon Telegraph and Telephone Corporation
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