Coating apparatus – Gas or vapor deposition – With treating means
Patent
1991-10-31
1994-07-26
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
With treating means
118 501, 118620, C23C 1600, C23C 1400, B05C 500
Patent
active
053324412
ABSTRACT:
Apparatus for plasma processing involving the gettering of particles having a high charge to mass ratio away from a semiconductor wafer are disclosed. In one aspect of the invention, magnets are used to produce a magnetic field which is transverse to an electric field to draw the negative particles away from the wafer to prevent the formation of a sheath which can trap the particles. In a second aspect of the invention, a power source is connected to the wafer electrode to maintain a negative charge on the wafer, thereby preventing negative particles from being drawn to the wafer surface when the plasma is turned off. In other embodiments of the invention, a low density plasma source is used to produce a large plasma sheath which permits particles to cross a chamber to be gettered. A low density plasma discharge followed by a pulse to a higher density is used to overcome the negative effect of an insulating layer between the wafer and the wafer electrode.
REFERENCES:
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patent: 4492610 (1985-01-01), Okano et al.
patent: 4645546 (1987-02-01), Matsushita
patent: 4818359 (1989-04-01), Jones et al.
patent: 4931405 (1990-06-01), Kamijo et al.
John H. Keller et al., The Transport of Dust Particles in Glow Discharge Plasmas, International Business Machines Corporation.
Barnes Michael S.
Coultas Dennis K.
Forster John C.
Keller John H.
O'Neill James A.
Everhart B.
Hearn Brian E.
International Business Machines - Corporation
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