Apparatus for gate valve movement in a minimum-space wet...

Details Apparatus for gate valve movement in a minimum-space wet... Apparatus for gate valve movement in a minimum-space wet...

2008-11-11

2011-12-27

Fristoe, Jr., John (Department: 3753)

Valves and valve actuation

With means to increase head and seat contact pressure

Gate valve

C251S175000

Reexamination Certificate

active

08083207

ABSTRACT:
Improved gate movement is provided in a wet process environment in which fluid collecting from a gate occurs adjacent to an access opening provided in a wall of a process chamber while the gate is moved relative to the opening. A minimum space environment is adjacent to the chamber due to a requirement for fluid collection next to the opening, yet the gate movement is provided without interference with a wafer transfer unit that moves the wafer through the access opening. Drives are configured within the minimum space environment to move the gate into and out of alignment with the opening and when aligned, to move the gate into and out of a gate closure position. The configuration of the drives avoids interference with the wafer transfer unit and the gate is received in a fluid collector during the gate movement to provide fluid collection during the wafer transfer.

REFERENCES:
patent: 5975492 (1999-11-01), Brenes
patent: 6056266 (2000-05-01), Blecha
patent: RE38318 (2003-11-01), Brenes
patent: 7762527 (2010-07-01), Schoen et al.

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