Apparatus for full wafer deposition

Details Apparatus for full wafer deposition Apparatus for full wafer deposition

1995-12-05

1998-09-08

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118725, C23C 1600

Patent

active

058039775

ABSTRACT:
A readily removable deposition shield assembly for processing chambers such as chemical vapor deposition (CVD), ion implantation, or physical vapor deposition (PVD) or sputtering chambers, is disclosed. The shield assembly includes a shield member which is mounted to the chamber for easy removal, such as by screws, and defines a space along the periphery of the substrate support. A shield ring is inserted into the peripheral space and is thus mounted in removable fashion and is automatically centered about the substrate. The shield ring overlaps the cylindrical shield and a deposition ring. The deposition ring removably rests upon a flange extending from the outer periphery of a substrate support pedestal. Collectively, these components prevent deposition on the chamber and hardware outside the processing region.

REFERENCES:
patent: 5192371 (1993-03-01), Shuto et al.
patent: 5228501 (1993-07-01), Tepman et al.
patent: 5238499 (1993-08-01), Van de Ven et al.
patent: 5370739 (1994-12-01), Foster
patent: 5480489 (1996-01-01), Hasegawa
patent: 5494523 (1996-02-01), Steger
patent: 5589224 (1996-12-01), Tepman

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