Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-06-25
1998-08-18
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118725, 392408, 392416, 2504922, C23C 1600
Patent
active
057953961
ABSTRACT:
An apparatus for forming a deposited film which includes a film forming chamber, with a means to evacuate the inside of the chamber. A substrate holder for holding a substrate is located in the chamber. Starting material gas is supplied to the chamber to enable film formation. A light energy source is also provided to irradiate the substrate in order to heat its surface. The strength of the light energy is controlled to provide a non-uniform temperature distribution pattern on the substrate.
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Hanna Jun-ichi
Ishihara Shunichi
Bueker Richard
Canon Kabushiki Kaisha
Lund Jeffrie R.
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