Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1995-02-27
1997-04-15
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
118715, 417415, C23C 1600
Patent
active
056205244
ABSTRACT:
Described herein is an apparatus and method for delivering fluid components for semiconductor processes such as chemical vapor deposition (CVD) and chemical etch processes. Any prescribed mixture of separate fluid reagents can be delivered with extreme accuracy and precision using the apparatus we describe here. The unique embodiment of a precision fluid pumping system utilizing internal pressure and temperature transducers, capacity volume and restrictive elements that comprise a continuous pulse-free system for use in CVD applications. This system has superior performance characteristics in the areas of: accuracy, precision, repeatability of the fluid mixture delivery and continuous repeatable delivery without intermittent pulsation. We describe a novel fluid pump whose design is integrated using a closed loop feedback system composed of temperature and pressure sensors. This allows the entire system to perform to in either an isobaric-isothermal mode or an isocratic-isothermal mode. The construction of this system is separated into three principle areas (Fluid Pump Hardware), (Fluid phase change hardware) and (Control algorithms), the complete embodiment constitutes a novel invention in the field of chemical delivery as pertaining to the fabrication of semiconductor devices.
REFERENCES:
patent: 3223040 (1965-12-01), Dinkelkamp
patent: 3818805 (1974-06-01), Johansson
patent: 3818807 (1974-06-01), Semple
patent: 3869963 (1975-03-01), Schindel
patent: 3943717 (1976-03-01), Schexnayder
patent: 3985019 (1976-10-01), Boehme
patent: 3985021 (1976-10-01), Achener
patent: 4045343 (1977-08-01), Achener
patent: 4234427 (1980-11-01), Boehme
patent: 4321014 (1982-03-01), Eburn
patent: 4352636 (1982-10-01), Patterson
patent: 4556367 (1985-12-01), Schmid
patent: 4600365 (1986-07-01), Riggenmann
patent: 4714545 (1987-12-01), Bente
patent: 4808092 (1989-02-01), Funke
patent: 4911405 (1990-03-01), Weissgerber
patent: 4947889 (1990-08-01), Ishikawa
patent: 5078922 (1992-01-01), Collins
patent: 5098741 (1992-03-01), Nolet
patent: 5129418 (1992-07-01), Shimomura
patent: 5160542 (1992-11-01), Mihira
patent: 5201851 (1993-04-01), Holmstrom
patent: 5204314 (1993-04-01), Kirlin
patent: 5243821 (1993-09-01), Schuck
patent: 5253981 (1993-10-01), Yang
patent: 5259731 (1993-11-01), Dhindsa
patent: 5440887 (1995-08-01), Nishizato
patent: 5450743 (1995-09-01), Buote
patent: 5470390 (1995-11-01), Nishikawa
patent: 5534069 (1996-06-01), Kuwabara
Chen J. James
Fan Chiko
Pearson Anthony
White, Jr. James L.
Breneman R. Bruce
Lund Jeffrie R.
LandOfFree
Apparatus for fluid delivery in chemical vapor deposition system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for fluid delivery in chemical vapor deposition system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for fluid delivery in chemical vapor deposition system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-357562