Apparatus for fabricating semiconductor device and method for fa

Details Apparatus for fabricating semiconductor device and method for fa Apparatus for fabricating semiconductor device and method for fa

1998-10-26

2000-02-15

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118723MP, C23C 1600

Patent

active

060240458

ABSTRACT:
A method for treating the surface of a semiconductor layer includes the step of removing an oxide from the surface of a semiconductor layer by adding fluorine or fluoride to hydrogen radicals separately from plasma atmosphere and thereafter exposing the semiconductor layer to the mixed gas and hydrogen-terminating the surface.

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