Apparatus for enhancing the lifetime of stencil masks

Details Apparatus for enhancing the lifetime of stencil masks Apparatus for enhancing the lifetime of stencil masks

2005-02-22

2005-02-22

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298030, C204S298110, C204S298280

Reexamination Certificate

active

06858118

ABSTRACT:
An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at least one deposition source being positioned in front of the mask, and further comprises a sputter means in which at least one sputter source, positioned in front of the mask holder means and outside the path of the lithography beam, produces a sputter ion beam directed to the mask in order to sputter off material from said mask in a scanning procedure and compensate for inhomogeneity of deposition.

REFERENCES:
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patent: 6583426 (2003-06-01), Kawanami et al.
patent: 20030183776 (2003-10-01), Tomimatsu et al.
patent: 211 885 (1984-07-01), None

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