Apparatus for enhanced inductive coupling to plasmas with reduce

Details Apparatus for enhanced inductive coupling to plasmas with reduce Apparatus for enhanced inductive coupling to plasmas with reduce

1993-01-19

1995-07-18

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723T, 20429811, 20429831, C23F 102, C23C 1600, C23C 1400

Patent

active

054338123

ABSTRACT:
A shield for shunting capacitive electric fields generated by an RF coil away from a gas plasma process chamber's dielectric window and toward ground. The shield comprise an electrically conducting, substantially planar body section having a periphery and adapted to be located between the RF coil and the dielectric window during plasma treating of a workpiece. A central opening in the body section and gaps about the periphery permit RF magnetic fields to inductively couple with the plasma and return around the coil, respectively. The shield substantially reduces interference by capacitive electric fields generated by the coil with inductive coupling between the coil and the gas plasma, thus substantially eliminating contamination from sputtering of the dielectric window by the capacitive electric fields.

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