Apparatus for electrophoretic deposition

Details Apparatus for electrophoretic deposition Apparatus for electrophoretic deposition

1982-03-31

1983-03-08

Kaplan, G. L.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204275, C25B 700

Patent

active

043760317

ABSTRACT:
An apparatus for electrophoretically depositing a coating on an article is disclosed which includes a tank for holding a supply of the suspension of the material which is desired to be deposited on the article, a holding means for supporting the article in the suspension and providing a voltage of a first polarity to the article which will attract the particles from the suspension, a pair of electrodes adapted to be suspended into the suspension and which can be supplied to the article being coated, and a distribution means for supplying and circulating the suspension within the apparatus in a smooth, laminar, non-turbulent manner. The distribution means includes a manifold for introducing the suspension uniformly within the apparatus and guide plates for guiding the suspension into the tank below the surface of the suspension in a laminar flow pattern without causing turbulence.

REFERENCES:
patent: 1907984 (1933-05-01), Kraner
patent: 2400576 (1946-05-01), Sigmund et al.
patent: 2447270 (1948-08-01), Olsen
patent: 3211639 (1965-10-01), McNeill et al.
patent: 3219571 (1965-11-01), Parent, Jr. et al.
patent: 3254004 (1966-05-01), Jackson et al.
patent: 3498905 (1970-03-01), Strickler
patent: 3654124 (1972-04-01), Lusk
patent: 3853736 (1974-12-01), Harnden et al.
patent: 4162955 (1979-07-01), Schregenberger

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