Apparatus for electron beam lithography

Details Apparatus for electron beam lithography Apparatus for electron beam lithography

1983-07-22

1986-03-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3726

Patent

active

045771111

ABSTRACT:
An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.

REFERENCES:
patent: 4182958 (1980-01-01), Goto et al.
patent: 4393310 (1983-07-01), Hahn
Variably Shaped Electron Beam Lithography System, EB55: 11 Electron Optics, Saitou et al., J. Vac. Sci. Tech., vol. 19, No. 4, Nov./Dec. 1981.

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