Apparatus for electron beam lithography

Details Apparatus for electron beam lithography Apparatus for electron beam lithography

1978-11-21

1980-04-22

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250311, 250397, A61K 2702

Patent

active

041996887

ABSTRACT:
An apparatus for electron beam lithography for automatically focusing a shaped electron beam uniformly projects an electron beam onto a reference aperture plate having an opening of a prescribed shape. The electron beam in the shape of the opening of the aperture thus obtained is reduced or concentrated and then projected onto a specimen, to thereby project the specimen as a microscopic pattern. The apparatus periodically changes the direction of the electron beam disposed between an electron gun emitting the electron beam and the reference aperture plate, and detects the deviation of the position of the final-image electron beam corresponding to the angle of deflection of the electron beam. The focal distance of a final-stage electron lens is adjusted so as to minimize positional deviation and thereby focus the projected electron beam.

REFERENCES:
patent: 3576438 (1971-04-01), Pease

Affiliated with

Also associated with

Rating

Apparatus for electron beam lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for electron beam lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for electron beam lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1476711