Apparatus for dry etching

Details Apparatus for dry etching Apparatus for dry etching

1994-08-17

1997-08-26

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

20429831, H05H 100

Patent

active

056606737

ABSTRACT:
An apparatus for dry etching includes a vacuum chamber into which an etching gas is to be introduced, an electrode disposed in the vacuum chamber, a material to be etched being placed on an upper surface of the electrode, at least one cylindrical ring disposed around the material, and a device for raising and lowering the rings so that the rings are raised above or lowered below the upper surface of the electrode.

REFERENCES:
patent: 4632719 (1986-12-01), Chow et al.
patent: 5213658 (1993-05-01), Ishida

Affiliated with

Also associated with

Rating

Apparatus for dry etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for dry etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for dry etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1985333