Apparatus for designing an optical metrology system...

Details Apparatus for designing an optical metrology system... Apparatus for designing an optical metrology system...

2008-03-27

2010-06-08

Bui, Bryan (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

C700S121000, C356S625000

Reexamination Certificate

active

07734437

ABSTRACT:
Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.

REFERENCES:
patent: 7589845 (2009-09-01), Tian et al.
patent: 2006/0064280 (2006-03-01), Vuong et al.
patent: 2008/0106729 (2008-05-01), Vuong et al.

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