Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-03-19
2000-09-12
Sheehan, John
Coating apparatus
Gas or vapor deposition
With treating means
118723IR, 156345HG, 20429837, C23C 1600
Patent
active
061161861
ABSTRACT:
An apparatus comprising a semiconductor processing chamber, a plasma generator, and a pipe connecting a semiconductor processing chamber and the plasma generator. The plasma generator includes a generation chamber, a radio frequency generator which generates an ion plasma within the generation chamber, a magnetic device which confines the plasma primarily within a center region of the generation chamber, and a thermally conductive member disposed around the outer surface of the generation chamber for removing heat away from the chamber.
REFERENCES:
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 5231334 (1993-07-01), Paranjpe
patent: 5304282 (1994-04-01), Flamm
Ho Henry
Li Steven T.
Ruspini Andrew J.
Applied Materials Inc.
Oltmans Andrew L.
Sheehan John
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