Apparatus for control of deposit build-up on an inner surface of

Details Apparatus for control of deposit build-up on an inner surface of Apparatus for control of deposit build-up on an inner surface of

1999-12-01

2000-12-05

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

156345, C23C 1600

Patent

active

061552038

ABSTRACT:
A method and apparatus for controlling deposit build-up on an interior surface of a dielectric member of a plasma processing chamber. The deposit build-up is controlled by selective ion bombardment of the inner surface by shifting location of a peak voltage amplitude of a voltage standing wave on an antenna such as a flat spiral coil of the plasma processing chamber. A region of high ion bombardment on the interior surface of the dielectric member is displaced by controlling the value of a termination capacitance over a range of values causing regions of low and high ion bombardment to move over the dielectric member in order to effect cleaning thereof.

REFERENCES:
patent: 4340462 (1982-07-01), Koch
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4948458 (1990-08-01), Ogle
patent: 5198718 (1993-03-01), Davis et al.
patent: 5200232 (1993-04-01), Tappan et al.
patent: 5226967 (1993-07-01), Chen et al.
patent: 5241245 (1993-08-01), Barnes et al.
patent: 5262029 (1993-11-01), Erskine et al.
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5464476 (1995-11-01), Gibb et al.
patent: 5473291 (1995-12-01), Brounley
patent: 5525159 (1996-06-01), Hama et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5531834 (1996-07-01), Ishizuka et al.
patent: 5580385 (1996-12-01), Paranjpe et al.
patent: 5587038 (1996-12-01), Cecchi et al.
patent: 5653811 (1997-08-01), Chan
patent: 5681393 (1997-10-01), Takagi
patent: 5685914 (1997-11-01), Hills et al.
patent: 5688357 (1997-11-01), Hanawa
patent: 5716451 (1998-02-01), Hamma et al.
patent: 5759280 (1998-06-01), Holland et al.
patent: 5800619 (1998-09-01), Holland et al.

Affiliated with

Also associated with

Rating

Apparatus for control of deposit build-up on an inner surface of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for control of deposit build-up on an inner surface of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for control of deposit build-up on an inner surface of will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-951434