Apparatus for coating a substrate, especially with electrically

Details Apparatus for coating a substrate, especially with electrically Apparatus for coating a substrate, especially with electrically

1992-07-07

1994-02-15

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1434

Patent

active

052863603

ABSTRACT:
In a method and an apparatus for coating a substrate (26) with electrically nonconductive coatings from an electrically conductive target (25) in a reactive (e.g., oxidizing) atmosphere, with a cathode (17) disposed in an evacuable coating chamber (16) and electrically cooperating with the target (25), the cathode (17), for the purpose of suppressing arcs, is connected to a DC power source and can be brought to a positive potential for brief time periods by means of an additional circuit (22, and 3 to 15, respectively), the frequency of this periodical polarity reversal being adjustable, depending on the coating to be deposited

REFERENCES:
patent: 4902394 (1990-02-01), Kenmotsu et al.
patent: 5015493 (1991-05-01), Gruen
patent: 5026471 (1991-06-01), Latz et al.
patent: 5126032 (1992-06-01), Szczyrbowski et al.
patent: 5192894 (1993-03-01), Teschner
Patent Abstracts of Japan: 2-38566 A. C712, Apr. 23, 1990, vol. 14, No. 197.
3-61368 A. C-836, May 29, 1991, vol. 15, No. 211.

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