Apparatus for coating a substrate by chemical vapor deposition

Details Apparatus for coating a substrate by chemical vapor deposition Apparatus for coating a substrate by chemical vapor deposition

1996-10-03

1998-09-08

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118719, 118723E, 118 501, 20429819, 20429825, 20429826, 31511121, C23C 1600

Patent

active

058039732

ABSTRACT:
A source of alternating current (3), is connected to two magnetron cathodes (4, 5), one pole (8) of the a.c. current source (4) being connected to one of the cathodes (4), while the other pole (9) is connected to the other cathode (5), each by its own power supply line (10, 11). Each of the two cathodes (4, 5) is installed in its own compartment (12, 13), the two compartments enclosing between them a third compartment (14), connected to a vacuum source (21). The two outside compartments (12, 13) are connected to each other by openings (15, 16) or gaps in the walls (17, 18) separating them, and the substrate (2) set up in the third compartment (14) facing a CVD source, which consists essentially of a reactive gas inlet (19) and a collimator (20).

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