Apparatus for coating a semiconductor wafer with a photoresist

Details Apparatus for coating a semiconductor wafer with a photoresist Apparatus for coating a semiconductor wafer with a photoresist

1998-02-05

2000-02-01

Edwards, Laura

Coating apparatus

With means to centrifuge work

118319, 118320, 118 70, 134153, 134157, 134175, 134200, 134902, B05C 500

Patent

active

060198435

ABSTRACT:
An apparatus coats a semiconductor wafer with photoresist that is to be etched in the manufacture of the semiconductor. The apparatus includes a body having an open top, a spin chuck for revolving a wafer fixed thereon at a uniform rate, a bowl for preventing photoresist from spattering on the body and which is installed inside the body, a photoresist dispensing nozzle for spraying photoresist on the wafer, a side rinse nozzle for removing photoresist adhered to the peripheral edge of the wafer, a cover for opening/closing the top of the body, and a cleaning device associated with the cover for cleaning the bowl. The apparatus allows the bowl to be cleaned while the cover is closed and the bowl is still disposed inside the body. The cleaning device includes a sprinkler and a pump.

REFERENCES:
patent: 5565034 (1996-10-01), Nanbu et al.
patent: 5591262 (1997-01-01), Sogo et al.
patent: 5762708 (1998-06-01), Motoda et al.

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