Measuring and testing – Probe or probe mounting
Patent
1997-06-09
1998-10-27
Raevis, Robert
Measuring and testing
Probe or probe mounting
G01R 3500
Patent
active
058279865
ABSTRACT:
A semiconductor wafer cleaning apparatus is provided with a bracket having an improved housing structure. The housing is provided to support a sensor that can stablely detect when wafers are placed in each cleaning bath. The sensor is generally in two parts, a photodiode for emitting a beam of light, and a photodetector for detecting the beam of light. A sensor supporting member receives the sensor and includes a cover, one or more side walls, a bottom part, and a plurality of projections formed on the bottom part. The bottom part has a through-hole and is spaced from an outer surface of the process vessel to form a first space between the bottom part and the process vessel. The plurality or are spaced to form a second space between the sensor and the bottom part of the sensor supporting member. A gas introducing section introduces a water vapor eliminating gas into the second space. The gas introduced into the second space flows through the through-hole into the first space. Any water vapor that covers either the photosensor or the outer surface of the process vessel is removed so that a light beam emitted from the photodiode can reach to the phototransistor.
REFERENCES:
patent: 3467113 (1969-09-01), Jacobsen et al.
patent: 4541277 (1985-09-01), Starnes, Jr.
patent: 4757255 (1988-07-01), Margozzi
patent: 4872356 (1989-10-01), Barnett et al.
patent: 5199308 (1993-04-01), Lawhon et al.
Jung Chang-Yong
Kang Tae-Chel
Raevis Robert
Samsung Electronics Co,. Ltd.
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