Apparatus for cleaning semiconductor wafer including heating...

Details Apparatus for cleaning semiconductor wafer including heating... Apparatus for cleaning semiconductor wafer including heating...

2007-07-03

2007-07-03

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S032000, C134S033000, C134S035000, C134S105000, C134S148000, C134S153000, C134S902000

Reexamination Certificate

active

10685515

ABSTRACT:
An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer, a cover for covering an upper part of the chamber, and a light source. The cleaning solution, preferably one of ozone water, hydrogen water, or electrolytic-ionized water, may be heated for a short time and used to clean the wafer.

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