Cleaning and liquid contact with solids – Apparatus – Having self cleaning means
Patent
1996-12-03
2000-02-15
Stinson, Frankie L
Cleaning and liquid contact with solids
Apparatus
Having self cleaning means
134198, 134902, 134199, B08B 302
Patent
active
060241071
ABSTRACT:
In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray rinse water on the top surface of the wafer and the wafer is rotated to remove the excess rinse water, thereby drying the wafer. A splash guard adjacent the edge of the wafer insures that the excess rinse water thrown off by the spinning wafer is deflected downward where it cannot again come into contact with the active side of the wafer. The platen is rotated dry at the same time, with no rinse water being splashed back onto the active side of the wafer. The spin dryer also includes a separate section which cleans and dries the end-effector of the robot which inserts the wafer into the spin dryer while the wafer is being dried.
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Lam Research Corporation
Stinson Frankie L
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