Apparatus for cleaning residual material from an article

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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Details

C204S22400M, C134S103200, C134S103300, C134S172000

Reexamination Certificate

active

06960282

ABSTRACT:
An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.

REFERENCES:
patent: 2307928 (1943-01-01), Hogaboom
patent: 4162952 (1979-07-01), Tribout
patent: 4483040 (1984-11-01), Magee et al.
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 5152878 (1992-10-01), Datta et al.
patent: 5543032 (1996-08-01), Datta et al.
patent: 5849173 (1998-12-01), Chandross et al.
patent: 5981084 (1999-11-01), Riabkov et al.
patent: 6032683 (2000-03-01), Casey et al.
patent: 6203691 (2001-03-01), Hoffman, Jr. et al.
patent: 6238529 (2001-05-01), Geissler et al.
patent: 6277799 (2001-08-01), Sachdev et al.
patent: 6280527 (2001-08-01), Sachdev et al.
patent: 6383303 (2002-05-01), Wee et al.
patent: 870854 (1998-10-01), None

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