Apparatus for cleaning conveyor chuck

Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...

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Details

1341041, 134122R, 134199, B08B 302

Patent

active

053797841

ABSTRACT:
The chuck for conveying semiconductor wafers has a pair of swing arms. Each arm has lower horizontal rods provided with a plurality of grooves for holding wafers and with vertical rods sandwiching the horizontal rods between them. A chuck cleaning apparatus has a cleaning chamber in a casing. A partition plate extends along the center of the cleaning chamber to divide it into first and second compartments. The top of the cleaning chamber is closed by a shielding plate, which has a pair of openings through which the arms come into and out of the cleaning chamber. A washing liquid pipe is incorporated with the partition plate in a horizontal direction. A pair of drying gas pipes extend horizontally in each of the first and second compartments and they are positioned a little higher than the liquid pipe, sandwiching each arm between them. Each gas pipe has a plurality of gas jetting apertures which are divided into a first group to jet gas to the vertical rods and a second group to jet gas to the horizontal rods. The first group of the apertures are inclined downward in a vertical plane and directed to converge toward the vertical rod in a horizontal plane. The second group of the apertures are also inclined downward in the vertical plane and directed perpendicular to the horizontal rod in the horizontal plane.

REFERENCES:
patent: 4694527 (1987-09-01), Yoshizawa
patent: 5224593 (1993-07-01), Thompson et al.
patent: 5226437 (1993-07-01), Kamikawa et al.
patent: 5253663 (1993-10-01), Tanaka et al.
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5265632 (1993-11-01), Nishi

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