Apparatus for cleaning and drying substrates

Details Apparatus for cleaning and drying substrates Apparatus for cleaning and drying substrates

2007-08-07

2007-08-07

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

C134S061000, C134S184000, C134S902000

Reexamination Certificate

active

10667855

ABSTRACT:
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.

REFERENCES:
patent: 3868272 (1975-02-01), Tardoskegyi
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5045120 (1991-09-01), Mittag et al.
patent: 5115576 (1992-05-01), Roberson, Jr. et al.
patent: 5205303 (1993-04-01), Gileta
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5315766 (1994-05-01), Roberson, Jr. et al.
patent: 5368649 (1994-11-01), Tzukazaki
patent: 5571337 (1996-11-01), Mohindra et al.
patent: 5593505 (1997-01-01), Erk et al.
patent: 5660642 (1997-08-01), Britten
patent: 5762749 (1998-06-01), Suzuki et al.
patent: 5772784 (1998-06-01), Mohindra et al.
patent: 5884640 (1999-03-01), Fishkin et al.
patent: 5913981 (1999-06-01), Florez
patent: 5928432 (1999-07-01), Foederl et al.
patent: 6119706 (2000-09-01), Foederl et al.
patent: 6217665 (2001-04-01), Suzuki
patent: 6311702 (2001-11-01), Fishkin
patent: 6328814 (2001-12-01), Fishkin et al.
patent: 6350322 (2002-02-01), Yates
patent: 6391117 (2002-05-01), Suzuki
patent: 6746544 (2004-06-01), Fishkin et al.
patent: 6962007 (2005-11-01), Maeda et al.
patent: 2001/0004898 (2001-06-01), Kamikawa et al.
patent: 0 385 536 (1990-09-01), None
patent: 10189528 (1998-07-01), None
Solid State Technology, “A moving-zone Marangoni drying process for critical cleaning and wet processing”, Jerald A. Britten, pp. 143-148, Oct. 1997.
Steag MicroTech, Poseidon Single Tank Tool, The New Powerful Single Bath Processor.
Semiconductor International, “Megasonic Cleaning—Acoustic streaming is delivered to small particles to maximize particle removal”, A.A. Busnaina and F.Dai, pp. 85-89, Aug. 1997.

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