Apparatus for cleaning a substrate

Details Apparatus for cleaning a substrate Apparatus for cleaning a substrate

2006-02-28

2006-02-28

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S095100, C134S095300, C134S902000

Reexamination Certificate

active

07004181

ABSTRACT:
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing process, a cleaning process and a working process of a subject, is provided with a water vapor body supplying means for supplying a water vapor body, and a water mist body supplying means for supplying a water mist body containing liquid water fine particles, and the structure is made such that said water vapor body and said water mist body are supplied to the subject by independently controlling said two means.

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patent: 6610168 (2003-08-01), Miki et al.

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