Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-05-05
1994-03-15
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429808, 156345, C23C 1434
Patent
active
052943208
ABSTRACT:
In a method for in situ cleaning a shield bearing of excess target material deposited in a physical vapor deposition chamber, during a cleaning cycle, a vacuum is created in the physical vapor deposition chamber. A gas mixture which includes a reactive gas is introduced into the physical vapor deposition chamber. The reactive gas is activated by plasma discharge. During the cleaning, the gas mixture is continuously removed from the vapor deposition chamber along with reaction products.
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IBM Techanical Disclosure Bulletin, vol. 20 No. 3, Aug. 1977 EP Search Report.
Maydan Dan
Somekh Sasson
Applied Materials Inc.
Morris Birgit E.
Nguyen Nam
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