Apparatus for centering substrates on support members

Chucks or sockets – With centering means

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Details

118728, 20429815, 279128, 361234, B25B 1100

Patent

active

056739222

ABSTRACT:
A semiconductor processing chamber includes a substrate support member on which the substrate is positioned during processing in the chamber. To align the substrate on the substrate support member, an alignment member extends about the perimeter of the substrate receiving portion of the support member. The alignment member includes an alignment face thereon, which urges a substrate into alignment with the substrate receiving face of the support member as the substrate is deposited on the support member. The alignment member may also include a recessed portion, which ensures the presence of a gap between the edge of the substrate and the support member when the substrate contacts the support member.

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patent: 5298465 (1994-03-01), Levy
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patent: 5352294 (1994-10-01), White et al.
patent: 5423918 (1995-06-01), Gupta et al.
U.S. Patent Application entitled, "Plasma Reactor with Multi-Section RF Coil and Isolated Conducting Lid," Serial No. 08/277,531, filed Jul. 18, 1994 (AM Docket 609).

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