Optics: measuring and testing – Standard
Patent
1983-08-10
1985-04-23
Willis, Davis L.
Optics: measuring and testing
Standard
356237, G01J 102
Patent
active
045126593
ABSTRACT:
A test device for calibrating an optical scanner wherein microscopic patterns of light scattering elements simulate the scattering of light from particles or flaws of different sizes. Simulation of different particles sizes is achieved by means of clusters or arrays of these light scattering elements having different areawise densities. Patterns of such clusters or arrays are disposed on a surface with intervening spaces where a random assortment of foreign particles may be expected. In this manner, the foreign particles may be directly compared to a test pattern. The test surface may be a semiconductor wafer having a thin, inert coating with openings therein forming the light scattering elements. The openings may be made by photolithographic techniques, i.e., masking and etching, so that various patterns on a surface may be all created simultaneously by the same process.
REFERENCES:
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4386850 (1983-06-01), Leahy
Gaston, "Standard Wafer for Intensity and Focus Testing", IBM Tech. Discl. Bull., vol. 24, No. 11A, pp. 5587-5589, Apr. 1982.
Galbraith Lee K.
Pecen Jiri
Koren Matthew W.
Schneck Thomas
Tencor Instruments
Willis Davis L.
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