Apparatus for calibrating a surface scanner

Optics: measuring and testing – Standard

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356237, G01J 102

Patent

active

045126593

ABSTRACT:
A test device for calibrating an optical scanner wherein microscopic patterns of light scattering elements simulate the scattering of light from particles or flaws of different sizes. Simulation of different particles sizes is achieved by means of clusters or arrays of these light scattering elements having different areawise densities. Patterns of such clusters or arrays are disposed on a surface with intervening spaces where a random assortment of foreign particles may be expected. In this manner, the foreign particles may be directly compared to a test pattern. The test surface may be a semiconductor wafer having a thin, inert coating with openings therein forming the light scattering elements. The openings may be made by photolithographic techniques, i.e., masking and etching, so that various patterns on a surface may be all created simultaneously by the same process.

REFERENCES:
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4386850 (1983-06-01), Leahy
Gaston, "Standard Wafer for Intensity and Focus Testing", IBM Tech. Discl. Bull., vol. 24, No. 11A, pp. 5587-5589, Apr. 1982.

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