Material or article handling – Chamber of a type utilized for a heating function and... – Including driven device and/or inclined flow path to carry...
Patent
1986-09-25
1987-06-02
Paperner, Leslie J.
Material or article handling
Chamber of a type utilized for a heating function and...
Including driven device and/or inclined flow path to carry...
414589, 414751, 432 11, 432239, 432253, 432259, C30B 2512, F27B 920, F27D 300
Patent
active
046699384
ABSTRACT:
An apparatus for loading a furnace with semiconductor wafers is known, which has at least two heat treatment chambers (1A, 1B, 1C, 1D), each of them having an associated stationary loading unit (8) with a receptacle movable in the direction of the furnace axis via a feed apparatus and having a loading system (2A, 2B, 2C, 2D) for semiconductor wafers. In order to provide such an apparatus for automatically loading the furnace with semiconductors which facilitates loading and overcomes the disadvantages of the known apparatuses, the apparatus according to the invention has a common central loading station (9) for all the semiconductor loading systems (2), and these loading systems are removable from the loading unit (8). Further, a transport device (10) is provided which is movable in two directions at right angles to one another as well as at right angles to the axis of the furnace and which has a coupling unit (12) for moving a respective loading system (2), loaded with semiconductor wafers, between the loading station (9) and the furnace loading unit (8).
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Bucci David A.
Heraeus Quarzschmelze GmbH
Paperner Leslie J.
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