Apparatus for automatically loading a furnace with semiconductor

Material or article handling – Chamber of a type utilized for a heating function and... – Including driven device and/or inclined flow path to carry...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

414589, 414751, 432 11, 432239, 432253, 432259, C30B 2512, F27B 920, F27D 300

Patent

active

046699384

ABSTRACT:
An apparatus for loading a furnace with semiconductor wafers is known, which has at least two heat treatment chambers (1A, 1B, 1C, 1D), each of them having an associated stationary loading unit (8) with a receptacle movable in the direction of the furnace axis via a feed apparatus and having a loading system (2A, 2B, 2C, 2D) for semiconductor wafers. In order to provide such an apparatus for automatically loading the furnace with semiconductors which facilitates loading and overcomes the disadvantages of the known apparatuses, the apparatus according to the invention has a common central loading station (9) for all the semiconductor loading systems (2), and these loading systems are removable from the loading unit (8). Further, a transport device (10) is provided which is movable in two directions at right angles to one another as well as at right angles to the axis of the furnace and which has a coupling unit (12) for moving a respective loading system (2), loaded with semiconductor wafers, between the loading station (9) and the furnace loading unit (8).

REFERENCES:
patent: 3744650 (1973-07-01), Henebry et al.
patent: 3811825 (1974-05-01), Enderlein
patent: 4439146 (1984-03-01), Sugita
patent: 4440538 (1984-04-01), Bowers
patent: 4468195 (1984-08-01), Sasaki et al.
patent: 4505630 (1985-03-01), Kaschner et al.
patent: 4516897 (1985-05-01), Snider et al.
patent: 4518349 (1985-05-01), Tressler et al.
patent: 4523885 (1985-06-01), Bayne et al.
patent: 4550239 (1985-10-01), Uehara et al.
patent: 4557657 (1985-12-01), Olson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for automatically loading a furnace with semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for automatically loading a furnace with semiconductor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for automatically loading a furnace with semiconductor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-610166

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.