Apparatus for automated pillar layout and method for implementin

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

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438 14, 438128, G01R 3126, H01L 2166

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active

060135360

ABSTRACT:
Disclosed is a method for automating support pillar design in air dielectric interconnect structures. The method includes selecting features having an interconnect dimension from a first mask. Providing an intermediate support pattern defining a pillar spacing. Identifying overlap regions where the features selected from the first mask overlap the intermediate support pattern. The method further including filtering the overlap regions to eliminate features that are less than the interconnect dimension. The filtering being configured to define discrete pillar locations associated with the first mask.

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