Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-08-03
1997-02-11
Mai, Ngoclan
Coating apparatus
Gas or vapor deposition
With treating means
118723FE, 118723FI, C23C 1600
Patent
active
056016522
ABSTRACT:
An apparatus for applying ceramic coatings using an electron beam-physical vapor deposition apparatus is described. The apparatus includes means for introducing the anionic constitutent of the ceramic into a coating chamber and means for confining the anionic constituent about the component to be coated during the coating process.
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Mullin Richard S.
Riendeau Leo A.
Ulion Nicholas E.
Mai Ngoclan
United Technologies Corporation
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