Apparatus for and method of processing substrate

Details Apparatus for and method of processing substrate Apparatus for and method of processing substrate

2004-01-28

2009-08-25

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S018000, C134S033000, C134S042000

Reexamination Certificate

active

07578887

ABSTRACT:
An apparatus for processing a substrate through successive steps including spin-drying the substrate with a single processing facility while preventing the substrate from being contaminated by a substrate processing liquid, etc. The apparatus for processing a substrate includes a substrate holder for holding and rotating a substrate, a scattering prevention cup for circumferentially surrounding the substrate held by the substrate holder to prevent a substrate processing liquid supplied to the substrate from being scattered around, and a scattering prevention cup cleaner for cleaning an inner wall surface of the scattering prevention cup.

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