Apparatus for and method of polishing workpiece

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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451 41, 451285, 451287, 451288, C23F 102, B24B 3704

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active

060335203

ABSTRACT:
A polishing apparatus for polishing a workpiece such as a semiconductor wafer has a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring for holding a workpiece and pressing the workpiece against the abrasive cloth under a first pressing force to polish the workpiece. A guide ring is vertically movably disposed around the top ring, and pressed against the abrasive cloth under a variable second pressing force. The first and second pressing forces are variable independently of each other, and the second pressing force is determined based on the first pressing force.

REFERENCES:
patent: 4954142 (1990-09-01), Carr et al.
patent: 5205082 (1993-04-01), Shendon et al.
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5635083 (1997-06-01), Breivogel et al.
patent: 5645474 (1997-07-01), Kubo et al.
patent: 5651724 (1997-07-01), Kimura et al.
patent: 5665656 (1997-09-01), Jairath
patent: 5795215 (1998-08-01), Guthrie et al.
Patent Abstracts of Japan, vol. 005, No. 033 (M-057), Feb. 28, 1981 & JP-A-55 157473 (Nippon Telegr & Teleph Corp), Dec. 8, 1980, * abstract.*
Patent Abstracts of Japan, vol. 06, No. 089 (M-132), May 27, 1982 & JP-A-57 027659 (Supiide Fuamu KK), Feb. 15, 1982, *abstract.*
Patent Abstracts of Japan, vol. 012, No. 067 (M-673), Mar. 2, 1988 & JP-A-62 213960 (Hitachi Ltd), Sep. 19, 1987, *abstract.*
Patent Abstracts of Japan, vol. 013, No. 184 (E-751), Apr. 28, 1989 & JP-A-01 010642 (Sony Corp), Jan. 13, 1989, *abstract.*

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