Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
Patent
1990-09-24
1993-07-13
Turner, Samuel A.
Optics: measuring and testing
By dispersed light spectroscopy
Utilizing a spectrometer
356346, 356381, G01B 1102
Patent
active
052278611
ABSTRACT:
An apparatus for and a method of evaluating a multilayer thin film of the present invention. An interference light beam in a predetermined wave number region is projected as a parallel beam onto a multilayer thin film sample and the interference light beam reflected by the sample is detected to find an interferogram. The interferogram is subject to Fourier transform, filtering and reverse Fourier transform so that a spatialgram is provided. Thereby the variation in incident angle of the light beam incident on the sample and in incident surface is reduced, and the spatialgram can be provided with accurate information of the multilayer thin film.
REFERENCES:
patent: 3319515 (1967-05-01), Flournoy
patent: 3899253 (1975-08-01), Overhoff
patent: 4555767 (1985-11-01), Case et al.
patent: 4748329 (1988-05-01), Cielo et al.
patent: 4927269 (1990-05-01), Keens et al.
IBM Technical Disclosure Bulletin, vol. 28, No. 2, Jul. 1985 "Measuring Thickness of Epitaxial Layer", pp. 493-495.
8164 Instruments and Experimental Techniques 27 (1984) Jul.-Aug. No. 4, Part 2, New York, pp. 1036-1040.
Fukazawa Ryoichi
Hattori Ryo
Nishizawa Seizi
Takahashi Tokuzi
Jasco Corporation
Keesee LaCharles P.
Mitsubishi Denki & Kabushiki Kaisha
Turner Samuel A.
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