Apparatus for analysis by ellipsometry, procedure for ellipsomet

Details Apparatus for analysis by ellipsometry, procedure for ellipsomet Apparatus for analysis by ellipsometry, procedure for ellipsomet

1989-03-06

1991-05-28

Willis, Davis L.

Optics: measuring and testing

By polarized light examination

Of surface reflection

G01N 2121

Patent

active

050188631

ABSTRACT:
An apparatus for analysis of samples (E) by ellipsometry, and an analysis procedure. The light beam (F) passes through a polarizer (4), a rotating (omega) doubly refracting plate (5) and an analyzer (6). The measurement uses the second and fourth harmonics of the speed of rotation of the plate (5). Application in particular to the growth and etching of thin films.

REFERENCES:
patent: 4176951 (1979-12-01), Robert et al.
Drevillon et al., "Fast Polarization Modulated Ellipsometer . . . ", Rev. Sci. Instrum., vol. 53, No. 7, pp. 964-977, 7/1982.
Patent Abstracts of Japan, vol. 10, No. 101 [P-447] [2158].
Proceedings of the Society of Photo Optical Instrumentation Engineers, vol. 276, 1981, pp. 180-186.
IBM Technical Disclosure Bulletin, vol. 19, No. 11, Apr. 1977, pp. 4134-4137.

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