Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-12-21
2010-06-29
Cleveland, Michael (Department: 1792)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345470, C156S345340
Reexamination Certificate
active
07743730
ABSTRACT:
An electrode assembly configured to provide a ground path for a plasma processing chamber of a plasma processing system is disclosed. The apparatus includes an electrode configured to be exposed to a plasma. The apparatus also includes a heater plate disposed above the electrode, wherein the heater plate is configured to heat the electrode. The apparatus further includes a cooling plate disposed above the heater plate, wherein the cooling plate is configured to cool the electrode. The apparatus also includes a plasma chamber lid configured to confine the plasma in the plasma chamber, wherein the plasma chamber lid includes a ground. The apparatus further includes a clamp ring configured to secure the electrode, the heater plate, and the cooling plate to the plasma chamber lid, the clamp ring is further configured to provide the ground path from the electrode to the chamber lid.
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Husain Anwar
Kholodenko Arnold
Chen Keath T
Cleveland Michael
IP Strategy Group, P.C.
Lam Research Corporation
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