Apparatus for aligning semiconductor wafer using mixed light wit

Details Apparatus for aligning semiconductor wafer using mixed light wit Apparatus for aligning semiconductor wafer using mixed light wit

1996-12-26

1999-01-12

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

2505593, 25055944, 250237G, 356363, 356400, G01N 2186, G01B 1100

Patent

active

058594396

ABSTRACT:
An alignment system of a lithography apparatus which is capable of obtaining an alignment mark without being influenced the height of the alignment mark and the thickness of the photoresist, includes a plurality of light sources emitting a light having each different wavelength, a plurality of beam splitters which reflects some portion of light emitted from the light source and transmits other portion of light and combines the reflected light to emit, a spacial filter for transmitting a light incident through the beam splitter, a first lens for condensing the light transmitted through the spacial filter, a wafer stage on an upper surface of which the wafer having a plurality of alignment marks to diffract a beam incident from the first lens is mounted, a second lens for condensing the light diffracted from the alignment mark on the wafer, a diffraction grating for diffracting the direction of the beam condensed in the second lens, a light collecting device for collecting the light reflected in the diffraction grating and converting the light into an electrical signal, and a control unit from controlling the wafer stage in accordance with the signal applied from the light collecting device.

REFERENCES:
patent: 4669883 (1987-06-01), Ina et al.
patent: 5191465 (1993-03-01), Yamashita et al.
patent: 5194744 (1993-03-01), Aoki et al.
patent: 5461237 (1995-10-01), Wakamoto et al.
patent: 5602644 (1997-02-01), Ota
patent: 5610718 (1997-03-01), Sentoku et al.

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