Apparatus and process for the deposition of a thin layer on a tr

Details Apparatus and process for the deposition of a thin layer on a tr Apparatus and process for the deposition of a thin layer on a tr

1988-11-22

1990-06-12

Wiesstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429806, 20429809, 20429814, 20429819, C23C 1435

Patent

active

049330578

ABSTRACT:
The present invention provides an apparatus and process for depositing a thin layer on the surface of a transparent substrate by the known process of cathodic sputtering. Atoms for forming the thin layer are produced from four cathodic plates arranged so as to form a rectangular parallelepiped. An anode covers one open end of the parallelepiped, and the substrate receving the thin layer is placed at the other open end of the parallelepiped. A magnetic field is produced by a permanent magnet, and the entire apparatus is supported by a metal support. A cooling channel surrounds the parallelepiped to enable the cooling of the cathodic plates.

REFERENCES:
patent: 3878085 (1975-04-01), Corbani
patent: 4428816 (1984-01-01), Class et al.
patent: 4622121 (1986-11-01), Wegmann et al.

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