Apparatus and process for deposition of hard carbon films

Details Apparatus and process for deposition of hard carbon films Apparatus and process for deposition of hard carbon films

1985-12-04

1989-01-03

Terapane, John F.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427113, 118 501, 118723, B05D 306, C23C 1400, C23C 1600

Patent

active

H00005665

ABSTRACT:
A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

REFERENCES:
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4382100 (1983-05-01), Holland
patent: 4563367 (1986-01-01), Sherman

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