Apparatus and methods for preventing rotational slippage...

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

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Details

C118S728000, C118S729000, C156S345510, C156S345520, C156S345530, C156S345540, C156S345550

Reexamination Certificate

active

10769549

ABSTRACT:
A substrate support assembly positively secures a substrate holder support to a rotation shaft with respect to rotationally applied forces. A substrate holder support is configured to have an opening in a socket into which, when aligned with an indentation in the rotational shaft to form a passage, a retaining member is removably inserted to engage both the socket opening and the shaft indentation. Methods of rotating a substrate while minimizing rotational slippage of the substrate holder support with respect to the shaft are also provided.

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patent: 2003/0224105 (2003-12-01), Chondroudis et al.
patent: 0 445 596 (1991-02-01), None
patent: 02309008 (1990-12-01), None

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